Retrofit CDSEM S-9380 执行原厂新机器同样验收技术指标：

提供样品测试验证；

General

Wafer size : 8-inch (200-mm size)

V-notch wafer of SEMI or JEIDA standards is applicable.

CD measurement principle : Cursor and line profile measurement

CD measurement range : 0.05 to 2.0 mm (either line width or hole diameter)

CD measurement reproducibility : ±1% or 0.6 nm (3 sigma), whichever larger

Throughput : due to the data after modification from Hitachi High-Technologies Corporation

Secondary electron image resolution

: 2 nm (at accelerating voltage of 0.8 kV; with

Hitachi’s reference specimen for resolution measurement)

Magnification : SEM image - 1,000´to 300,000´

Optical microscope image - approximately 110x (220x is optional)

升级：实验室数据上传接口；